Structural and corrosion behaviour of stoichiometric and substoichiometric TiN thin films

architecture and engineering of nanoscale sculptured thin films and determination of their properties

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Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films

Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...

Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films

Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...

Ti2Al(O,N) formation by solid state reaction between substoichiometric TiN thin films and Al2O3(0001) substrates

Influence of Co and Fe substitution on optical and structural properties of zinc oxide thin films

Zn0.97TM0.03O (TM = Co, Fe) thin films were deposited onto glass substrates by the sol–gel method and the effects of transition metals substitution on structural and optical properties of ZnO films were investigated. The X-ray diffraction patterns revealed that the films have wurtzite structure. Optical transmittance of the films was recorded in the range of 200 -800 nm wave length and the band...